Home  |  Online Registration  |  Online Submission  |  Contact us  |  中文

Workshop Supported by

IEEE Photonics Society

(Singapore and Hongkong Chapters)

Chair:

Shum Ping Perry

Nanyang Technological University (NTU),

Singapore

Co-chairs:

Xinliang Zhang

Huazhong University of Science and Technology (HUST), China

Ho Aaron,

The Chinese University of Hong Kong (CUHK), Hong Kong, China

Abstract

Plasmonics is considered as a key technology for a number of application areas in photonics, particularly those related nanophotonics. Because of the unique properties of surface plasmons, applications of surface plasmon polaritons (SPP), surface plasmon resonance (SPR) and surface-enhanced Raman scattering (SERS) are being studied intensively. Other potential applications in optical computing, meta-materials, sub-wavelength photonics, biological and medical detection are also being explored. The advancement of nanofabrication techniques further accelerates investigation efforts and applications, notably along the fields of SPR and SERS, as metallic nanostructures may be readily designed and fabricated to meet the stringent sub-wavelength requirements. Given the multidisciplinary nature of plasmonics technology, which covers, physics, chemistry, biology and engineering etc, this event provides a timely platform for reporting latest developments in the field and to facilitate sharing of information and exchange of ideas.

Correspondence:

Xinliang Zhang, xlzhang@mail.hust.edu.cn

Yi Wang, ywangwnlo@mail.hust.edu.cn

Confirmed invited Speakers

Aaron H P Ho, Chinese Univ of HK (Hong Kong, China)• Mandy Xia Yu, SIMTech (Singapore) •Min Qiu, KTH (Sweden) •Seng‐Tiong HO, Northwestern Univ (USA) •Tahsin Akalin, Lille Univ (France) •Zhaowei LIU, UCSD (USA) •Anotoly Zayata, The Queen’s University of Belfast (UK) •Efim I. Kats, Institut Laue-Langevin, Grenoble (France) •Michael Somekh, University of Nottingham (UK) •Andrei V. Kabashin, CNRS (France) •Tim Davis, CSIRO (Australia) •H.C. Ong, Chinese Univ of HK (Hong Kong, China) •Naoki KISHIMOTO, National Institute for Materials Science (Japan) •B.D.Gupta, Indian Institute of Technology Delhi (India) •Yung‐Chiang LAN, National Cheng Kung University (Taiwan, China) •Wei Hong, Institute of Physics, Chinese Academy of Sciences (China); A. DEREUX, l’Universite de Bourgogne (France)